Optimized Sampling for View Interpolation in Light Fields with Overlapping Patches

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dc.contributor.authorSchedl, David C.en_US
dc.contributor.authorBimber, Oliveren_US
dc.contributor.editorDiamanti, Olga and Vaxman, Amiren_US
dc.date.accessioned2018-04-14T18:32:45Z
dc.date.available2018-04-14T18:32:45Z
dc.date.issued2018
dc.description.abstractOptimized sampling masks that reduce the complexity of camera arrays while preserving the quality of light fields captured at high directional sampling resolution are presented. We propose a new quality metric that is based on sampling-theoretic considerations, a new mask estimation approach that reduces the search space by applying regularity and symmetry constraints, and an enhanced upsampling technique using compressed sensing that supports maximal patch overlap. Our approach out-beats state-of-the-art view-interpolation techniques for light fields and does not rely on depth reconstruction.en_US
dc.description.sectionheadersImaging, Video, and Rendering
dc.description.seriesinformationEG 2018 - Short Papers
dc.identifier.doi10.2312/egs.20181034
dc.identifier.issn1017-4656
dc.identifier.pages17-20
dc.identifier.urihttps://doi.org/10.2312/egs.20181034
dc.identifier.urihttps://diglib.eg.org:443/handle/10.2312/egs20181034
dc.publisherThe Eurographics Associationen_US
dc.subjectComputing methodologies Computational photography
dc.subjectImage
dc.subjectbased rendering
dc.titleOptimized Sampling for View Interpolation in Light Fields with Overlapping Patchesen_US
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